Add anonymized version of lithography machine initialization model to CIF benchmarking models
This was already mentioned here: https://gitlab.eclipse.org/eclipse/escet/escet/-/issues/522#note_1074177.
The model is publicly available at: https://github.com/sbthuijsman/CASE21_enforce_requirements
It concerns an anonymized version of the original model, but this is not that relevant for benchmarking models.
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